IONIX® HV Circular Sputtering Sources

Circular IONIX® sputtering sources for high vacuum applications:

  • target-Ø 50 – 300 mm (2” – 12”)
  • standardized interfaces (KF/ISO)
  • flange or internal mounting
  • various magnet array options
  • for use with DC-, RF- or HiPIMS processes
  • for fundamental research and small scale production
  • more than 450 sources supplied

IONIX® high vacuum sputtering sources are available in a wide range of target sizes from 2'' up to 12''. With our profund knowledge of sputtering technology and our experience we are capable for special designs to serve almost any need and vacuum environment.

IONIX® high vacuum sputtering sources offer a wide range of magnetic and mechanical options, e.g. flange/internal mounted, tilt able/adjustable, magnetrons with electropneumatic shutters, balanced/unbalanced magnet arrays, magnet arrays for high target utilization, for enhanced film thickness uniformity or low operating pressure.

Mechanical and mounting options

  • with or without chimney
  • +/- 45° tilt or 40° insitu-tilt
  • Pneumatic, electric or manual shutter
  • Gas distribution
  • Quick coupling feedtrough for wall-mounting
  • Z-Manipulator
  • Flange mounting option
  • RF-Power option

Magnetic options

  • balanced/unbalanced
  • high target utilization
  • high film thickness uniformity
  • low pressure operation