IONIX® Circular UHV Flange Mounted Solutions

All IONIX® UHV sputtering sources with target size in the range of 1'' - 5'' (Ø25.4 - 127 mm) can be mounted to a wide variety of flange sizes (eg. DN63CF - DN200CF) and configurations incorporating shutters, chimneys, tilts, z-shifts and gas distributions. Utilizing a manual or insitu-tilt the focal point of the sputtering source can be adjusted for different target-to-substrate distances and target materials.

Using flange assemblies allows easy positioning of multiple sputtering sources in a confocal sputtering arrangement. Connection for cooling water, electrical connection is in one place.

 

 

  • For target-Ø 25.4 – 127 mm (Ø 1“- 5“)
  • Pneumatic shutters
  • Gas distribution
  • Z-stroke 100 mm
  • +/- 45° tilt or 40° insitu-tilt
  • Flanges DN63CF -DN200CF

 

Technical data

IONIX® Ø1'' UHV IONIX® Ø2'' UHV IONIX® Ø3'' UHV IONIX® Ø4'' UHV IONIX® Ø5'' UHV
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Possible Configurations

 

 

IONIX® circular UHV source, directly mounted on a flange

 

 

IONIX® circular UHV cluster solutions

Due to the IONIX® modular design a huge variety of UHV cluster flanges can be made incorporating from 2 - 8 sputtering sources on a single vacuum flange.