IONIX® Rectangular Magnetron Sputtering Sources
IONIX® rectangular magnetron sputtering sources with advanced water cooling circuits are designed for industrial production purposes and are available in a wide range of widths and lengths. The utilized directed cooling water flow and multipolar magnet arrays accomodate the use of clamped targets at power levels of 20W/cm2 (Cr, Al) and above. The rectangular magnetron sputtering sources can be internally mounted with standard vacuum interfaces (KF, CF, ISO) or on external flanges with dimensions as requested by system design.
- Standardized target widths
- Standardized interfaces (ISO/CF)
- Internal/external mounting
- Directly/indirectly cooled targets
- Internal gas distribution
|
target width „A“ |
target length „B“ |
cathode width „C“ |
cathode length „D“ |
height „H“ |
|
63 mm / 2,5‘‘ |
200 … 1000 mm |
102 mm |
B + 40 mm |
64 mm |
|
89 mm / 3,5‘‘ |
250 … 2000 mm |
135 mm |
B + 47 mm |
75 mm |
|
100 mm / 4‘‘ |
300 … 2000 mm |
147 mm |
B + 47 mm |
66 mm |
|
127 mm / 5‘‘ |
300 … 4000 mm |
172 mm |
B + 47 mm |
71 mm |
|
152 mm / 6‘‘ |
500 … 4000 mm |
205 mm |
B + 57 mm |
80 mm |
|
200 mm / 8‘‘ |
900 … 4000 mm |
265 mm |
B + 75 mm |
84 mm |