IONIX® 2'' HV Circular Sputtering Source
The IX2 is the smallest IONIX® high vacuum magnetron with target diameter of 50.8 mm (2'') used in thin film research and development as it is the basis for small, versatile and economic R&D type thin film deposition systems. The target thickness can vary from 2 up to 6 mm.
The IX2 features direct cooling of the target with an integrated backing plate. The modular magnet array is completely isolated from the cooling water. A threaded anode allows easy adjustment of the dark space gap when varying target thickness. Optionally a magnet array for magnetic target materials ( for 2 mm Ni, 1 mm Fe) is available or can be retrofitted later.
Via the DN25KF interface the sputtering source can be either mounted on a straight Ø1'' or Ø3/4'' tube or on a tilt. Also ISO or CF flange mounted sources are available.
Features
- internal mounting with DN25KF interface
- target diameter 2" (50.8 mm)
- targets 2 - 6 mm thick, non-magnetic
- optionally: magnetic targets Ni 2 - 3 mm, Fe 1mm thick
- directly cooled integrated backing plate
- magnet array completely isolated from cooling water
- for DC, AC, RF and pulsed operation
- water tubes Ø6xØ4 mm
Technical data
Target | Dimensions | ||
form | circular/planar | diameter | 81 mm |
diameter | 2" (50 mm) ± 0,1mm | height | 58 mm |
thickness | 2 - 6mm | Mounting | tube Ø1" x 300 mm |
cooling | indirect/direct *** |
DN 25 KF | |
Working pressure | argon | Construction materials | stainless steel OFHC - type copper PFTE |
nonmagnetic targets | 3x10-3- 10-1 mbar | Cooling water | |
best performance | 5x10-3-5x10-2mbar | flow | 1 l / (min x kW) |
Typical rates | max. inlet temperature | ≤ 30°C | |
Al, 100 mm distance | 8 Å/s @300W | max. pressure | ≤ 2 bar open drain |
Cu, 100 mm distance | 15 Å/s @ 300W | Ø tubing | Ø6xØ4 mm PTFE |
Electrical specifications | Magnet array | permanent NdFeB | |
max. power, watts DC | 600 W DC * |
max. temperature | 60°C |
max. power, watts RF | 400 W RF * |
Accessories and options | |
max. current DC | 5 A | - quick coupling f/t | - ±45° flexible tilt |
max. voltage DC | 1000 V | - ferromagnetic materials | - 40° insitu tilt |
connector DC | type N | - gas inlet option | - chimney option |
connector RF | type 7/16 ** | - pneumatic shutter | - flange mounting |
* This value refers to the magnetron itself. The maximum power is determined by the target material and its bonding or clamping technique. ** RF-Version requires special connector and/or installation. More details on request. *** Direct cooling on request. ![]() We reserve the right for technical changes in design and specifications without notice or obligations. |
Mounting options
- with or without chimney
- +/- 45° tilt or 40° insitu-tilt
- straight tube, OD 1'' or OD 3/4''
- Pneumatic, electric or manual shutter
- Gas distribution
- Quick coupling feedtrough
- Z-Manipulator
- ISO or CF flange mounting option
Dimensions
Dimensions for IX2 flange assembly consisting of sputtering source with chimney, tilt, pneumatic shutter and gas distribution on DN100ISO-K
Dimensions for IX2 magnetron assembly consisting of sputtering source with chimney, quick coupling feedtrough available either for Ø32 mm or Ø25.4 mm bore (OD 1'' or OD 3/4'' tube)