IONIX® 3'' HV Circular Sputtering Source
The IX3 high vacuum magnetron with target diameter of 76.2 mm (3'') is used in thin film research and development as it is the basis for small, versatile and economic R&D type thin film deposition systems. The IX3 can be used with non-magnetic targets varying in thickness from 4 - 8 mm.
The IX3 features direct cooling of the target with an integrated backing plate. A threaded anode allows easy adjustment of the dark space gap with varying target thickness. Optionally a magnet array for magnetic target materials ( for 3 mm Ni, 1 mm Fe) is available or can be retrofitted later.
Via the DN25KF interface the sputtering source can be either mounted on a straight Ø1'' or Ø3/4'' tube or on a tilt. Also ISO or CF flange mounted sources are available.
Features
- internal mounting with DN25KF interface
- target diameter 3" (76.2 mm)
- targets 4 - 8 mm thick, non-magnetic
- optionally: magnetic targets Ni 3 mm, Fe 1 mm thick
- directly cooled integrated backing plate
- magnet array completely isolated from cooling water
- for DC, AC, RF and pulsed operation
- water tubes Ø6xØ4 mm
Technical data
| Target | Dimensions | ||
| form | circular/planar | diameter | 110 mm |
| diameter | 3" (76.2 mm) ± 0.25mm | height | 60 mm |
| thickness | 4 - 8 mm | Mounting | tube Ø1" x 300 mm |
| cooling | indirect/direct *** |
DN 25 KF | |
| Working pressure | argon | Construction materials | stainless steel OFHC - type copper PFTE |
| nonmagnetic targets | 3x10-3- 10-1 mbar | Cooling water | |
| best performance | 5x10-3-5x10-2mbar | flow | 1 l / (min x kW) |
| Typical rates | max. inlet temperature | ≤ 30°C | |
| Al, 100 mm distance | 14 Å/s @1000W | max. pressure | ≤ 2 bar open drain |
| Cu, 100 mm distance | 25 Å/s @ 1000W | Ø tubing | Ø6xØ4 mm PTFE |
| Electrical specifications | Magnet array | permanent NdFeB | |
| max. power, watts DC | 1250 W DC* | max. temperature | 60°C |
| max. power, watts RF | 750 W RF* | Accessories and options | |
| max. current DC | 5 A | - quick coupling f/t | - ±45° flexible tilt |
| max. voltage DC | 1000 V | - ferromagnetic materials | - 40° insitu tilt |
| connector DC | type N | - gas inlet option | - chimney option |
| connector RF | type 7/16 ** | - pneumatic shutter | - flange mounting |
| * This value refers to the magnetron itself. The maximum power is determined by the target material and its bonding or clamping technique. ** RF-Version requires special connector and/or installation. More details on request. *** Direct cooling on request. 
We reserve the right for technical changes in design and specifications without notice or obligations. |
Mounting options
- with or without Chimney
- +/- 45° tilt or 40° insitu-tilt
- straight tube, OD 1'' or OD 3/4''
- Pneumatic, electric or manual shutter
- Gas distribution
- Quick coupling feedtrough
- Z-Manipulator
- ISO or CF flange mounting option
Dimensions
Dimensions for IX3 flange assembly consisting of sputtering source with chimney, tilt, pneumatic shutter and gas distribution on DN160ISO-K
Dimensions for IX3 magnetron assembly consisting of sputtering source with chimney, quick coupling feedtrough available either for Ø32 mm or Ø25.4 mm bore (OD 1'' or OD 3/4'' tube)
