IONIX® 4'' UHV Circular Sputtering Source
The IONIX® IX4U magnetron sputtering source has a target diameter of 101.6 mm (4'') and can be used with non-ferromagnetic targets varying from 4 -10 mm thickness. The magnetron features indirect cooling of the target, discrete target clamping and a sliding anode allowing easy adjustment of the dark space gap when varying target thickness.
The IX4U has a fully UHV compatible design utilizing only metallic seals and construction materials with low-outgassing rate. The IX4U is bakeable up to 200°C with its SmCo magnet array inserted and can be in DC, AC, RF and pulsed operation.
Optionally a version with a magnet array for ferromagnetic target materials ( Ni 4 mm, Fe 2 mm thick) is available. The IX4U can be either internally mounted via DN63CF interface or directly flange mounted on a DN160CF flange.
Features
- internal mounting with CF interface
- target diameter 4" (101.6 mm)
- targets 4 - 10 mm thick, non-magnetic
- magnetic targets: Ni 4, Fe 2 mm thick
- indirectly cooled targets
- magnet array completely isolated from cooling water
- for DC, AC, RF and pulsed operation
- water tubes Ø6xØ4 mm
Technical data
| Target | Dimensions | ||
| form | circular/planar | diameter | 132 mm |
| diameter | 4" (101.6 mm) ± 0.25mm | height | 98 mm |
| thickness | 4 - 10 mm | Mounting | tube Ø1" x 300 mm |
| cooling | indirect *** |
DN 63 CF | |
| Working pressure | argon | Construction materials | stainless steel OFHC - type copper Al2O3 |
| nonmagnetic targets | 3x10-3- 10-1 mbar | Cooling water | |
| best performance | 5x10-3-5x10-2mbar | flow | 1 l / (min x kW) |
| Typical rates | max. inlet temperature | ≤ 30°C | |
| Mo, 200 mm distance | 7 Å/s @ 1000W | max. pressure | ≤ 2 bar open drain |
| Cu, 200 mm distance | 20 Å/s @ 1000W | Ø tubing | Ø6xØ4 mm PTFE |
| Electrical specifications | Magnet array | permanent SmCo | |
| max. power, watts DC | 1500 W DC* | max. temperature | 200°C |
| max. power, watts RF | 1000 W RF* | Accessories and options | |
| max. current DC | 10 A | - quick coupling f/t | - ±45° flexible tilt |
| max. voltage DC | 1000 V | - ferromagnetic materials | - 40° insitu tilt |
| connector DC | type N | - gas inlet option | - chimney option |
| connector RF | type 7/16 ** | - pneumatic shutter | - flange mounting |
| * This value refers to the magnetron itself. The maximum power is determined by the target material and its bonding or clamping technique. ** RF-Version requires special connector and/or installation. More details on request. *** Direct cooling on request. 
We reserve the right for technical changes in design and specifications without notice or obligations. |
Mounting options
- Chimney
- +/- 45° tilt or 40° insitu-tilt
- Pneumatic, electric or manual shutter
- Gas distribution
- Quick coupling feedtrough
- Z-Manipulator
- CF flange mounting option
Dimensions
Dimensions for IX4U flange assembly consisting of sputtering source with chimney, tilt, pneumatic shutter and gas distribution on DN160CF